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Output details

13 - Electrical and Electronic Engineering, Metallurgy and Materials

University of Ulster

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Output 4 of 71 in the submission
Article title

Acetylene–argon plasmas measured at a biased substrate electrode for diamond-like carbon deposition: I. Mass spectrometry

Type
D - Journal article
Title of journal
Plasma Sources Science and Technology
Article number
015003
Volume number
20
Issue number
1
First page of article
015003
ISSN of journal
0963-0252
Year of publication
2011
Number of additional authors
2
Additional information

Part funded by Seagate Ltd, this is the first of a two part investigation (see dx.doi.org/10.1088/0963-0252/20/1/015004) into the relationship between plasma neutral and ionic species and their impact on the plasma enhanced growth of thin film materials. This is the first report where the mass spectrometry and ion energy analysis was integrated into the high voltage RF substrate electrode to obtain true measurements in an industrially relevant film growth environment. This work reflects ongoing collaboration with Seagate into carbon materials and plasma processes and also development of commercial biomedical coatings (e.g. US patent 6,638,569).

Interdisciplinary
-
Cross-referral requested
-
Research group
B - Functional Materials & Devices
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-