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Improved Photoreaction Yields for Soft Ultraviolet Photolithography in Organothiol Self-Assembled Monolayers

CPW-3: Photo-cleavable molecules are used in the fabrication of patterned surfaces by the spatially-selective exposure of surface-bound self-assembled monolayers by ‘soft’ uv radiation. They are important for many applications (e.g. in liquid crystal devices), but photolysis yields are generally <50%, restricting their applicability. This paper, collaborative with the Schools of Physics and Chemistry, and arising from our Basic Technology programme (EP/C006755, PI:Davies, £2.64M), and on-going collaboration with Seiko-Epson (fukushima.hitoshi@exc.epson.co.jp), demonstrated yields >90% through use of suitable catalysts. This patented research (GB0917396.4, priority 05/10/2009) underpinned our EPSRC CDT in molecular-scale engineering (EP/J500124, PI:Davies, £1,999,639).