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13 - Electrical and Electronic Engineering, Metallurgy and Materials

Open University

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Output 38 of 64 in the submission

Article title

Ion flux and ion distribution function measurements in synchronously pulsed inductively coupled plasmas

Type

D - Journal article

DOI

10.1116/1.4790364

Title of journal

Journal of Vacuum Science and Technology A

Article number

020604

Volume number

Issue number

First page of article

ISSN of journal

0734-2101

Year of publication

2013

URL

http://oro.open.ac.uk/36578/

Number of additional authors

Additional information

A robust process monitoring sensor for materials processing plasmas was conceived and patented by Braithwaite in 1995. Since then he has further developed it and many international groups have adopted it. In 2008 Lam Research, a $7.5 billion company making semiconductor processing equipment, began installing the sensor in dielectric and metal etch tools. The same method has been adapted for use in pulsed plasma etching, as reported here. Pulsed plasmas are shown to be more controllable than CW plasmas for semiconductor processing. For three months following publication this article featured in the top 20 downloads of the journal.

Interdisciplinary

Cross-referral requested

Research group

None

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract