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Output details

15 - General Engineering

University of Edinburgh (joint submission with Heriot-Watt University)

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Article title

Fabrication and Measurement of Test Structures to Monitor Stress in SU-8 Films

Type
D - Journal article
Title of journal
IEEE Transactions on Semiconductor Manufacturing
Article number
-
Volume number
25
Issue number
3
First page of article
346
ISSN of journal
0894-6507
Year of publication
2012
URL
-
Number of additional authors
9
Additional information

This is a key output from an industrially funded project (£1M, National Semiconductor-TI), which is developing thick electroplated metal features for micro-scale magnetic components, such as inductors. This invited paper, extending earlier IEEE ICMTS 2010 (DoI:10.1109/ICMTS.2010.5466870), presents, for the first time, measurements of structures fabricated in the thick photoresist SU-8. This has resulted in 3 further PhD studies, one of which is 50% funded by TI, and another by the Smart Microsystems Flagship project FS/01/02/10 (EPSRC £1.5M) with industrial contributions from 7 multinationals (£1.4M), all within ERPE. The work has been extended in IEEE ICMTS 2013 (DoI:10.1109/ICMTS.2013.6528137)

Interdisciplinary
-
Cross-referral requested
-
Research group
A - Manufacturing & Materials
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-