Output details
13 - Electrical and Electronic Engineering, Metallurgy and Materials
University of Birmingham : A - Electronic, Electrical and computer engineering
Effect of film structure on the electrochemical properties of gold electrodes for neural implants
This paper describes a new technique for fabricating low impedance electrodes for neural implants. For many years, research and commercial devices have relied on the deposition onto gold electrodes of porous TiN, which may be mechanically unstable and have composition sensitive properties. Here, for the first time, it is shown that comparable nano-porosity can be induced in sputtered gold layers by tuning the deposition conditions. This non-multilayer process simplifies the fabrication process and potentially increases robustness. This process is applicable to cochlear implants, deep brain stimulation electrodes etc. The work is an output from an EPSRC Basic Technology Scheme.
