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15 - General Engineering

Nottingham Trent University

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Article title

Low temperature remote plasma sputtering of indium tin oxide for flexible display applications

Type

D - Journal article

DOI

10.1016/j.tsf.2009.04.072

Title of journal

Thin Solid Films

Article number

Volume number

518

Issue number

First page of article

1355

ISSN of journal

00406090

Year of publication

2009

URL

Number of additional authors

Additional information

The paper describes the results of low temperature deposition and processing of Indium Tin Oxide (ITO) Transparent Conducting Oxide (TCO) thin films on flexible substrates. Work, funded as part of a Collaborative TSB/EPSRC R&D project with Plasma Quest Ltd. [HESSLIS TP K2514K DT/E01030X ] demonstrated low temperature deposition of ITO with neutral internal stress, suitable for reel to reel application. The development of ITO process from this research led to exploitation via design, manufacture and licensing of Plasma Quest’s deposition systems. Orders for equipment were received from UK, US and China [Barry Holton, PQL, TP K2514K Final Report 2010].

Interdisciplinary

Cross-referral requested

Research group

None

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract