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Output details

13 - Electrical and Electronic Engineering, Metallurgy and Materials

University of Manchester : B - Electrical and Electronic Engineering

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Output 151 of 179 in the submission

Article title

Spatially correlated erbium and Si nanocrystals in coimplanted SiO2 after a single high temperature anneal

Type

D - Journal article

DOI

10.1063/1.3294645

Title of journal

Journal of Applied Physics

Article number

044316

Volume number

107

Issue number

First page of article

ISSN of journal

1089-7550

Year of publication

2010

URL

Number of additional authors

Additional information

This research was a collaboration between Surrey University in the UK and McMaster University in Hamilton, Ontario, and was aimed at improving the density of optically active erbium in silicon oxide in order to create on-chip amplifiers and lasers for inter-chip communication. The work lead to the award by EPSRC of a £1.5m multicentre grant lead by Manchester (EP/H009817/1) and involving the schools of Engineering at UCL and Surrey University and the School of Physics at Imperial College. It has also been used by the leading international groups in this field, e.g. at Caen, DOI: 10.1186/1556-276X-8-39, and Trento, DOI: 10.1364/OME.2.001278.

Interdisciplinary

Cross-referral requested

Research group

Z - Microelectronics and Nanostructures

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract