Output details
15 - General Engineering
University of Durham
Article title
Controlled-width track in through silicon via using 3D holographic photolithography with modified electrodepositable photoresist
Type
D - Journal article
Title of journal
Journal of Micromechanics and Microengineering
Article number
015012
Volume number
20
Issue number
1
First page of article
-
ISSN of journal
0960-1317
Year of publication
2010
Number of additional authors
6
Additional information
Discussions are in place to integrate our process reported in this paper into mask alignment instrumentation produced for Silicon Fabrication by Suss Micro-optics SA. Contact name Reinhard Voelkel. Proposals have also been made to Samsung to exploit our findings. The research enables sensor arrays to be formed which is of interest to the through life engineering manufacturing community and EPSRC subequently funded a (£5m) research centre EP/I033246/1 (2011) with Rolls Royce, ref Andy Harrison.
Interdisciplinary
-
Cross-referral requested
-
Research group
B - Electronics Research Group
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-
