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12 - Aeronautical, Mechanical, Chemical and Manufacturing Engineering

Newcastle University

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Article title

X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers

Type

D - Journal article

DOI

10.1116/1.4793284

Title of journal

Journal of Vacuum Science & Technology B

Article number

021208

Volume number

Issue number

First page of article

ISSN of journal

2166-2754

Year of publication

2013

URL

http://link.aip.org/link/?JVB/31/021208

Number of additional authors

Additional information

X-ray assisted cluster sputtering is a new effect, first reported and explained in this paper, and completely unexpected by the XPS community. The effect must be controlled for accurate analysis with cluster ion beams. US firm ThermoElectron, the largest XPS instrument manufacturer, has rewritten its main "Avantage" software and plans to reengineer hardware to cope with the effect (contact: Paul Mack; paul.mack@thermofisher.com). The research reported in this paper supported the EPSRC proposal “National EPSRC Open-access Facility for Interface Engineering,” funded under the 2013 “Capital for Great Technologies” programme (administered as an additional £2.7M to the University equipment account, EP/K022679/1).

Interdisciplinary

Cross-referral requested

Research group

G - MEMS and Sensors

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract