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13 - Electrical and Electronic Engineering, Metallurgy and Materials

University College London

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Article title

Minimization of the contact resistance between InAs nanowires and metallic contacts

Type

D - Journal article

DOI

10.1088/0957-4484/24/4/045703

Title of journal

Nanotechnology

Article number

045703

Volume number

Issue number

First page of article

ISSN of journal

0957-4484

Year of publication

2013

URL

Number of additional authors

Additional information

Selected as “Feature Article” in this issue (see http://ej.iop.org/pdf/nano/vol24/na2404-webcover.pdf ). A systematic study of a novel method for making Ohmic contacts to semiconductor nanowires. Of major technological importance for many nanoelectronics applications including topologically-protected qubits and nanowire spintronic devices. Led to licensing of nanofabrication technology to Raith GmbH – currently undergoing field trials (contact Frank Nouvertne, nouvertne@raith.de ). This work central to EPSRC-funded projects on Majorana Fermions (EP/J007137/1; £797,878) and nanowire electronics (EP/H005544/1; £1,661,788). Featured on front cover of New Electronics magazine, 12/6/12.

Interdisciplinary

Cross-referral requested

Research group

None

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract