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Output details

13 - Electrical and Electronic Engineering, Metallurgy and Materials

Glyndŵr University

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Output 11 of 64 in the submission

Article title

Continuous Flow Supercritical Chemical Fluid Deposition of Optoelectronic Quality CdS

Type

D - Journal article

DOI

10.1002/adma.200803751

Title of journal

Advanced Materials

Article number

Volume number

Issue number

First page of article

4115

ISSN of journal

15214095

Year of publication

2009

URL

Number of additional authors

Additional information

This RCUK funded work (EP/C006763/1) is a result of an interdisciplinary collaborative project between physicists and chemists from three British universities, which can be regarded as a milestone in the technological development of supercritical chemical fluid deposition of direct bandgap semiconductors. This technique is complementary to the conventional CVD to work with low votatility reagents as well as making it possible to deposit materials within high aspect ratio templates due to the unique properties of supercritical fluids. The high quality of products from this research work has demonstrated its potential applications and impact to the solar energy and semiconductor industry.

Interdisciplinary

Yes

Cross-referral requested

Research group

None

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract