Output details

Charge dissipation layer optimisation for nano-scale electron-beam lithography pattern definition onto diamond

Reproducible processing for the production of nano-scale structures on diamond substrates with feature size down to 20 nm is reported for the first time in this work. Optimization of the processing conditions using electron beam lithography to produce structures from 20 to 200 nm in dimension is described as part of an extensive fabrication study. These techniques will directly benefit and further enable development of a range of emerging applications including diamond-based transistors, quantum devices, chemical/radiation/bio-sensors and electro-mechanical systems. This work contributed to an invited presentation at the Hasselt Diamond Workshop, (Belgium 2013).