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Output details

15 - General Engineering

University of Glasgow

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Article title

Benchmarking of scaled InGaAs implant-free NanoMOSFETs

Type
D - Journal article
Title of journal
IEEE Transactions on Electron Devices
Article number
-
Volume number
55
Issue number
9
First page of article
2297
ISSN of journal
0018-9383
Year of publication
2008
URL
-
Number of additional authors
4
Additional information

This paper describes the first realistic Monte Carlo evaluation of the performance potential of III-V MOSFETs. The research is supported by the FP7 STREP project DUALLOGIC (www.ims.demokritos.gr/DUALLOGIC/) and highlights the advantages of a new device architecture called Implant Free Quantum Wire (IFQW) transistors for boosting the performance of n-channel CMOS transistors. The results have guided the project industrial partners (IBM, ST Microelectronics and IMEC) in developing prototype devices. The clear advantages of the IPQW transistor demonstrated by the simulations resulted in the inclusion of III-V channel transistors into the International Roadmap for Semiconductor from 2011 onwards (www.itrs.net/).

Interdisciplinary
-
Cross-referral requested
-
Research group
A - Electronics & Nanoscale Engineering
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-