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Output details

15 - General Engineering

University of Glasgow

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Article title

Current variability in Si nanowire MOSFETs due to random dopants in the source/drain regions: a fully 3-D NEGF simulation study

Type
D - Journal article
Title of journal
IEEE Transactions on Electron Devices
Article number
-
Volume number
56
Issue number
7
First page of article
1388
ISSN of journal
0018-9383
Year of publication
2009
URL
-
Number of additional authors
4
Additional information

This is the first report of full-scale quantum transport simulations in the presence of individual impurities with attractive potential. Funded by the EPSRC project 'Meeting the Material Challenges of Nano-CMOS Electronics' (GR/S80097/01), the paper illustrates the significant access resistance and on-current variability in sub-10 nm nano-wire transistors. The methodology developed forms the core of the Non-Equilibrium Green's Function (NEGF) transport module of the 3D 'atomistic' simulator GARAND licensed to GSS Ltd. (www.goldstandardsimulations.com/products), which is essential for the development of sub-10nm CMOS devices. The paper also resulted in a keynote talk at SISPD 2011.

Interdisciplinary
-
Cross-referral requested
-
Research group
A - Electronics & Nanoscale Engineering
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-