Output details
13 - Electrical and Electronic Engineering, Metallurgy and Materials
University of Plymouth
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Article title
Nanofabrication of SiC templates for direct hot embossing for metallic photonic structures and meta materials
Type
D - Journal article
Title of journal
Microelectronic Engineering
Article number
n/a
Volume number
85
Issue number
5-6
First page of article
1147
ISSN of journal
0167-9317
Year of publication
2008
URL
-
Number of additional authors
12
Additional information
This paper reports a new technique for mass producing a nano-imprinting stamp with a minimum feature size of 10nm, developed in collaboration with Rutherford Appleton Laboratory using sputtered amorphous SiC material. It also shows the use of this template in direct hot-embossing nano-imprinting, for the production of nanostructures in metal and plastic substrates. The notable 10nm-size was state-of-the-art, and the technique has since been taken further by others (e.g. A. Boltasseva et al, Metamaterials; A. Cannon et al, J. of Micromechanics and Microengineering).
Interdisciplinary
-
Cross-referral requested
-
Research group
None
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-
