Output details
13 - Electrical and Electronic Engineering, Metallurgy and Materials
University of Salford
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Article title
Low Temperature Growth of Photoactive Titania by Atmospheric Pressure Plasma
Type
D - Journal article
Title of journal
Plasma Processes and Polymers
Article number
-
Volume number
6
Issue number
9
First page of article
575
ISSN of journal
16128869
Year of publication
2009
URL
-
Number of additional authors
2
Additional information
We reported - for the first time - the application of volume-glow-discharge atmospheric pressure (AP) plasmas to CVD thin film growth of titania. Crucially, we were able to demonstrate the onset of crystalline film growth which is critical for many desirable titania properties ( high refractive index and also photocatalytic properties) initiated under 300 C (c.f. thermal - typically 450C+). This work was subsequently extended to include pulsed plasma operation, which is now filed as a patent (no: P750984GB).
Interdisciplinary
-
Cross-referral requested
-
Research group
B - Materials synthesis and characterisation
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-
