Output details
12 - Aeronautical, Mechanical, Chemical and Manufacturing Engineering
University of Birmingham : B - Chemical Engineering
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Output 0 of 0 in the submission
Article title
Fullerene Resist Materials for the 32 nm Node and Beyond
Type
D - Journal article
Title of journal
Advanced Functional Materials
Article number
-
Volume number
18
Issue number
13
First page of article
1977
ISSN of journal
1616-301X
Year of publication
2008
URL
-
Number of additional authors
5
Additional information
Introduces a novel non-polymeric fullerene based molecular photoresist capable of recording patterns at feature sizes of 25nm with industrial speed. Molecular resists are of increasing interest to the lithography community as the small molecular size over traditional polymeric resists offers advantages for nanopatterning, whilst the high carbon content of fullerene give excellent etching characteristics. The work was supported by EPSRC, EU and Industrial funding. It led to a patent (GB0420702.3) and to the formation of a spin out company (Irresistible Materials Ltd), which has subsequently licensed the patent, raised venture capital and is now commercializing the product.
Interdisciplinary
-
Cross-referral requested
-
Research group
D - Speciality Materials
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-
