Output details
15 - General Engineering
Swansea University
Article title
Ni∕Al[sub 0.2]Ga[sub 0.8]N interfacial reaction and Schottky contact formation using high quality epitaxial layers
Type
D - Journal article
Title of journal
Journal of Applied Physics
Article number
-
Volume number
103
Issue number
5
First page of article
053708
ISSN of journal
00218979
Year of publication
2008
URL
-
Number of additional authors
9
Additional information
From a project that grew out of collaboration with Materials and Engineering Research Institute (MERI) at Sheffield Hallam University to understand the factors that affect the electronic properties of metal contacts to large bandgap materials. This paper successfully demonstrated the crucial interplay between the nanoscale structure of the metal-semiconductor interface and the resulting electrical properties. The author made a substantial contribution to the conception and design of the study, the organisation of the study and to the development of the theoretical model.
Interdisciplinary
-
Cross-referral requested
-
Research group
A - Multidisciplinary Nanotechnology Centre
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-