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13 - Electrical and Electronic Engineering, Metallurgy and Materials

University of Bath

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Output 45 of 74 in the submission

Article title

Nanoimprint lithography resist profile inversion for lift-off applications

Type

D - Journal article

DOI

10.1016/j.mee.2011.04.063

Title of journal

Microelectronic Engineering

Article number

Volume number

Issue number

First page of article

3011

ISSN of journal

0167-9317

Year of publication

2011

URL

http://dx.doi.org/10.1016/j.mee.2011.04.063

Number of additional authors

Additional information

This paper presents for the first time a robust process that transforms the capability of nano-imprint lithography to create nano-patterned materials. Such new materials can be used in a wide range of applications, including solid-state lighting, materials for energy harvesting and photonic crystal biosensors. The process developed was a key technology underpinning the award of a European grant (FP7-GA-228999-2, Euro1.1M), two EPSRC grants (EP/I012591/1, £1.36M and EP/H049576/1, £164k) and a European Research Council grant (FP7-IDEAS-ERC-320963, Euro2.3M).

Interdisciplinary

Cross-referral requested

Research group

A - Advanced Sensor Technologies

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract