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Output details

13 - Electrical and Electronic Engineering, Metallurgy and Materials

Liverpool John Moores University

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Article title

Read and pass disturbance in the programmed states of floating gate flash memory cells with high-κ interpoly gate dielectric stacks

Type
D - Journal article
Title of journal
IEEE Transactions on Electron Devices
Article number
-
Volume number
60
Issue number
7
First page of article
2261
ISSN of journal
0018-9383
Year of publication
2013
URL
-
Number of additional authors
9
Additional information

* The first paper ever that identified the electron trapping and detrapping in the IPD stacks as the source for the read/pass disturbance in Flash memory.

* Significant as the identification of the origin of the disturbance opens a way for its minimization through material selection and structure optimisation in the development of future Flash memory technology.

* The results have led to two new official projects (600,000 Euros) collaborating with world leading research consortium at IMEC including Intel and Samsung from 2014-2016 (Dr. Houdt, IMEC Memory Group Manager, vanhoudt@imec.be), to investigate the new 3D and RRAM memory technology, respectively.

Interdisciplinary
-
Cross-referral requested
-
Research group
None
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-