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15 - General Engineering

Keele University

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Output 60 of 127 in the submission

Article title

High-energy electron beam lithography of octadecylphosphonic acid monolayers on aluminum

Type

D - Journal article

DOI

10.1021/la701733n

Title of journal

LANGMUIR

Article number

Volume number

Issue number

First page of article

2057

ISSN of journal

0743-7463

Year of publication

2008

URL

http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=000253460200074&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=65c2c6c1224a08d1a3198315ff59119e

Number of additional authors

Additional information

A reliable method for large scale creation of chemical patterns of self-assembled monolayers (SAMs) with lateral dimensions from μm to nm scale is highly sought after for a range of biological applications in cell and nucleotide patterning. This work describes the patterning of areas of a size relevant for bio-applications through electron exposure of a new type of SAM not restricted to thiols or silanes, ODPA-SAMs. High-energy electron beam lithography (50 kV) using a purpose-built tool achieved efficient and highly reproducible formation of substrates with high lateral resolution of chemical patterns over large areas, thus making future biomedical applications attainable.

Interdisciplinary

Cross-referral requested

Research group

None

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract