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Output details

15 - General Engineering

University of Warwick

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Article title

Improved analog performance in strained-Si MOSFETs using the thickness of the silicon-germanium strain-relaxed buffer as a design parameter

Type
D - Journal article
Title of journal
IEEE Transactions on Electron Devices
Article number
-
Volume number
56
Issue number
12
First page of article
3041
ISSN of journal
0018-9383
Year of publication
2009
URL
-
Number of additional authors
3
Additional information

This paper contributed towards a successful grant application with the EPSRC on underpinning power electronic devices (EP/K034804/1). This is a £2 million project on power semiconductors of which the first author is a Co-I. The paper investigated the thermal performance of novel semiconductor devices and was a contributing factor towards further research in thermal considerations in power electronics. The modelling techniques used in the paper contributed towards the base of expertise required for understanding the thermal performance of new electronic materials.

Interdisciplinary
-
Cross-referral requested
-
Research group
None
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-