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Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry

This paper presents and verifies the first analytical description of argon cluster-ion sputtering yields beyond empirical fits. It presents the first sufficiently sensitive weighing technology to accurately measure sputter yields, using the internationally leading facilities at the National EPSRC XPS Users' Service, a £3.1M EPSRC mid-range facility established at Newcastle in 2011. All major XPS suppliers internationally have adopted gas-cluster technology, with strong uptake from customers (50% of new XPS orders to instrument manufacturer Kratos now specify this technology, contact: chris.blomfield@kratos.co.uk) and users will need this analytical description and reference data to plan and calibrate measurements.