Output details
15 - General Engineering
Nottingham Trent University
Laser annealing of thin film electroluminescent devices deposited at a high rate using high target utilization sputtering
Combination of research from two TSB collaborative R&D projects [HESSLIS TP K2514K, Plasma Quest Ltd. and SRELD TP2/ED/6/S/10265, Ultra Electronics Ltd.] resulting in the demonstration of a low temperature deposition and fabrication technique for thin film electroluminescent display devices. The technique of combining the high rate sputtering and laser processing for optimisation of transparent semiconducting materials generated new collaboration with Cambridge University Engineering Dept. (A. Flewitt) for work on Zinc Oxide, and Knowledge Transfer Project with PragmatIC Printing Ltd. [sKTP1000722].