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13 - Electrical and Electronic Engineering, Metallurgy and Materials
University of Salford
Atmospheric pressure chemical vapour deposition of F doped SnO2 for optimum performance solar cells
This paper employed novel (in house developed) fast experimentation/combinatorial methodologies to develop a process resulting in enhanced performance TCOs for PV application. The technology is designed compatible with industrial requirements such as high process speed, up-scaling, and low costs. The optical and electrical properties of layers were found to be comparable to commercially available low pressure CVD. Optical absorptance below 1% is achieved for films ~0.8 microns thick. This work brought together significant International players in the thin film PV field. The developed process has been patented (DE 20090814) with collaborators, and is being exploited by CVD Technologies Ltd.
