Output details
15 - General Engineering
Keele University
High-energy electron beam lithography of octadecylphosphonic acid monolayers on aluminum
A reliable method for large scale creation of chemical patterns of self-assembled monolayers (SAMs) with lateral dimensions from μm to nm scale is highly sought after for a range of biological applications in cell and nucleotide patterning. This work describes the patterning of areas of a size relevant for bio-applications through electron exposure of a new type of SAM not restricted to thiols or silanes, ODPA-SAMs. High-energy electron beam lithography (50 kV) using a purpose-built tool achieved efficient and highly reproducible formation of substrates with high lateral resolution of chemical patterns over large areas, thus making future biomedical applications attainable.