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Output details

13 - Electrical and Electronic Engineering, Metallurgy and Materials

University of the West of Scotland

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Output 17 of 26 in the submission
Article title

Nanowire Lithography on Silicon

Type
D - Journal article
Title of journal
Nano Letters
Article number
-
Volume number
8
Issue number
5
First page of article
1358
ISSN of journal
1530-6992
Year of publication
2008
URL
-
Number of additional authors
6
Additional information

Nanowire lithography reported in this paper was highlighted in journal of “Science” as one of the promising future nano-technologies. Dr. Fu was further invited to publish a review paper on nano-patterning using deep-RIE in J. Vac. Sci. Technology (2009-27-1520). He has then given several invited talks in international Conferences (including Thin film 2010 in Singapore, 2011 Nanomanufacuring Conference in China). The work attracted collaborations worldwide (including Swansea University, STS Company, University of Electronic Science and Technology of China, Xian Jiaotong University, and Zhejiang University, China) for further development and potential commercialization of this technique for MEMS and Solar Cells.

Interdisciplinary
-
Cross-referral requested
-
Research group
None
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-