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Output details

13 - Electrical and Electronic Engineering, Metallurgy and Materials

University of the West of Scotland

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Output 22 of 26 in the submission
Article title

The effect of PECVD plasma decomposition on the wettability and dielectric constant changes in silicon modified DLC films for potential MEMS and low stiction applications

Type
D - Journal article
Title of journal
AIP Advances
Article number
-
Volume number
2
Issue number
3
First page of article
032128
ISSN of journal
21583226
Year of publication
2012
URL
-
Number of additional authors
2
Additional information

This paper demonstrates the suitability of using combined optical probes like Raman spectroscopy, Ellipsometry and Plasma chemistry during deposition to understand and control stiction and nano-tribology in Micro-electromechanical (MEMS) and Nano-devices based on Si-DLC thin films. The traditional method of obtaining tribological information is not easily applicable on the nano-scale where the Van der Waals force dominates surface interactions. This is an extension of previous work, A.A. Ogwu et al, Acta Materialia (2003), Physica B (1999), J.Phys.D (1999).The link between the chemical surface energy probe and optical probes through the Hamaker constant is explored to gauge the stiction process.

Interdisciplinary
-
Cross-referral requested
-
Research group
None
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-