Output details
15 - General Engineering
Nottingham Trent University
Low temperature remote plasma sputtering of indium tin oxide for flexible display applications
The paper describes the results of low temperature deposition and processing of Indium Tin Oxide (ITO) Transparent Conducting Oxide (TCO) thin films on flexible substrates. Work, funded as part of a Collaborative TSB/EPSRC R&D project with Plasma Quest Ltd. [HESSLIS TP K2514K DT/E01030X ] demonstrated low temperature deposition of ITO with neutral internal stress, suitable for reel to reel application. The development of ITO process from this research led to exploitation via design, manufacture and licensing of Plasma Quest’s deposition systems. Orders for equipment were received from UK, US and China [Barry Holton, PQL, TP K2514K Final Report 2010].