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Output details

15 - General Engineering

University of Glasgow

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Output 35 of 285 in the submission
Article title

Accurate statistical description of random dopant-induced threshold voltage variability

Type
D - Journal article
Title of journal
IEEE Electron Device Letters
Article number
-
Volume number
29
Issue number
8
First page of article
946
ISSN of journal
0741-3106
Year of publication
2008
URL
-
Number of additional authors
4
Additional information

Production yield is crucial to the $300B/annum semiconductor industry, and accurate statistical prediction of device/circuit yield is only possible through large-scale statistical device simulation. This work, funded by EPSRC (EP/E003125/1), initiated the use of high throughput computing and databases in the statistical analysis of device variability for ensembles of 1e5 devices. Roy was invited to talk at ICCAD (San Jose, 2009) and SemiOI (Kyiv, 2010) as a result. The methodology developed to handle >25k parallel runs and Gbytes of data has been commercialized via a spin out company, and is core to its GARAND modelling tool (www/goldstandardsimulations.com/products/garand).

Interdisciplinary
-
Cross-referral requested
-
Research group
A - Electronics & Nanoscale Engineering
Proposed double-weighted
No
Double-weighted statement
-
Reserve for a double-weighted output
No
Non-English
No
English abstract
-