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Output details

15 - General Engineering

University of Liverpool

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Output 45 of 103 in the submission

Article title

Gadolinium nitride films deposited using a PEALD based process

Type

D - Journal article

DOI

10.1016/j.jcrysgro.2011.10.049

Title of journal

Journal of Crystal Growth

Article number

Volume number

338

Issue number

First page of article

111

ISSN of journal

00220248

Year of publication

2012

URL

Number of additional authors

Additional information

Development of an Atomic Layer Deposition process for gadolinium nitride spintronic applications. This work was done in collaboration with SAFC Hitech and Hanyang University, Seoul, South Korea.

Interdisciplinary

Cross-referral requested

Research group

None

Proposed double-weighted

Double-weighted statement

Reserve for a double-weighted output

Non-English

English abstract